|Group||CMOS Wafer water Cleaning machine|
|Min. Order||1 piece|
|Terms of Payment||all|
●Apply for cleaning camera module surface dust , through high pressure pure water washing and Water vapour two fluid cleaning , effectively remove Holder, CMOS ontology, such as Wafer surface dust particles.
●Human-machine integration, one-button operation,fully automatic complete whole clean process.
●With integration cleaning system.
●Stainless steel machine cabinet ,Large observation Windows, practical and beautiful;
●Special design cleaning room,secondary FFU air filtration,DI water and air open loop drain provide a clean environment for whole clean process;
●Low energy consumption and low running noise;
●Small compact appearance design, and less occupied area ,convenient deployment.
●Whole system monitoring by instrument-ration, running stable and safety.
●Automatic air filter , to ensure the cleaning effect.
Water vapour two fluid
380V 10A 50Hz
High speed centrifugal dehydration (ion wind assisted)
Pure water cleanliness
Pure water filter precision
Pure water pressure
Air filter precision
Compressed air capacity
Dust clean diameter
compressed air pressure
Max pure water consumption
machine body with 316 mirror stainless steel
Max work plate
Max clean size
Centrifugal clean pressure
Work plate ration speed